“志当存高远”，上海纳腾仪器有限公司致力于微纳米领域的最佳解决方案，为各大高校，科研院所，工厂企事业单位提供先进的科学仪器及相关耗材，为祖国微纳米事业的腾飞贡献一份绵薄之力。如今上海纳腾仪器有限公司已是国内少数几家专业提供纳米科学仪器的企业。在原子力显微镜、近场光显微镜、纳米压印、光学轮廓仪等领域，拥有一支在纳米检测领域经验丰富、技术过硬的团队。能够出色地完成售中、售后的全方位服务。
随着微纳米领域的不断革新，上海纳腾仪器有限公司一如既往加强与各大高校、科研院所的合作，进而推出各类应用于化学、生物、物理等领域的优秀产品。
Shanghai NTI Co., Ltd. is one of the major suppliers of Micro-nano instrument and its accessories in China. We have a powerful sale and technical support team which had experienced in the successful promotion of instruments which concerning the measurement of Micro-nano-scale. Our team shared the market with more than one hundred SPMs , software, accessories and services.
Today Shanghai NTI Co., Ltd. has established good relations with most of the famous domestic universities, colleges， research institutions and R&D center of companies. We are now continually introducing new products covering the area of Micro-nanotech and other critical enabling instruments in other areas such as: physics, chemistry, materials science, life science, etc. as well.
The Silicon Nitride film window of SHNTI is the most cost-effective products, its applications is very wide. It could use for analysis like TEM、X-Ray、SEM and so on.
It can completely avoid the background of carbon when it be used at TEM analysis.
Silicon nitride film window used in the X-Ray can be achieved maximum transmission rate of soft X-ray (such as vacuum ultraviolet). The softer X-ray, the lower energy ，the worse penetrating it could have, so that it required thinner silicon nitride window. Especially in the “off-axis” work module (i.e. film and beam at a certain angle),we also need thinner film window, and better X-Ray penetration.
Silicon nitride film window as a durable substrate used in the SEM .First observed in the TEM, And then in the same area under the SEM to match, and also be used in AFM compared with their TEM images.
Commonly measurement of existing technology or ST Silicon nitride film, although it has a high residual stress to the ST film, they are not strong enough, and easy to break. Based on the needs of X-ray microscopy and transmission imaging, Silicon nitride film on the soft X-ray must satisfy the smaller absorption. The Silicon nitride film windows supplied by SHNTI are low stress load tools (also available as mini-dish, support film), that improved the shortcomings of the original technology.
Characteristics Silicon nitride film windows of SHNTI:
1、The transmittance
Sometimes we mention that window film has light performance, which can “see through” at visually. For example , in light microscope, light transmittance will be reduced when the thickness of film over a certain level. In estimating the transmission performance of the film, the absorption line should be noticed, if it’s necessary to consider the optical properties, absorption limit should be lower than 13nm. When the absorption limit is 13nm,100nm thick film transmittance is 44%; When the absorption limit is 2.4nm, the light transmission decline to 13%.
2、Flatness
Silicon nitride film window film is smooth, strength, density is good, very stable surface smoothness (roughness less than 1nm). Normally there’s no negative effect for the application. We can see that the surface of silicon nitride thin film situation by the AFM testing.
3、 Temperature
The products can be used in high temperature areas, it is able to withstand 1000 degree centigrade heating, It’s very suitable for the surface of a silicon wafer substrates grown by CVD using a variety of nano-materials. Silicon nitride itself is a super hard material, with lubrication, and wear resistance, it’s a kind of atomic crystal, Anti-oxidation at the high temperature. And it is also resistant to thermal shock, the air heated to above 1 000℃, and then rapidly cooling rapidly heating, it will not shatter.
4、 chemically inert
No reaction with other inorganic acids , except HF.
5、 Hydrophilic
SHNTI silicon nitride film window does not have the hydrophilic nature itself, but according to the needs of scientific research, it could be transformed. Such as plasma etching, chemical transformation, the silicon nitride film window can be hydrophilic, ,more convenient to experimental applications.
6、practicality
SHNTI Silicon nitride film provide more accurate composition analysis to the samples of carbon included, reduce the contamination occurred, and themselves will not become a source of pollution, enhance the accuracy of the analysis. It is suitable to act as a carrier of colloid, aerogels, organic materials and experimental characterization of nanoparticles. But also can be used for the ideal carrier of biological and wet cell samples. And there are many potential applications.
7、 Stability
Mechanical stability of silicon nitride support membrane allows it have TEM/SEM/EDX/XPS/AFM and other analysis simultaneously. And it will also play a great role in the many research of nano-particles, in particularly, Nitrogen-containing nanoparticles researchers found that these silicon nitride films are indispensable at their experiment.
The applications of SHNTI silicon nitride film
1、For soft X-ray , you can use two pieces of silicon nitride film windows take the sample in the middle(which samples have water or volatile atmosphere),plastic vacuum sealed, so that it will not allow destruction of the experimental sample vacuum chamber environment , and you can get good experimental results.
2、When the silicon nitride film window is used for cell biological studies, directly to cultured cells can be treated in the hydrophilic silicon nitride film on the window, or curing the silicon nitride window, then you can study the cell morphology and signs under the instruments, even lives cells.
3、The observation window as a vacuum device. Silicon nitride film adapt a vacuum atmosphere, coupled with its excellent light transmission, by a certain point of observation it can be non-destructive vacuum chamber interior situation.
4、Direct evaporation of new materials on the silicon nitride film, then do characterization, analysis and testing, to avoid the kind of tedious re-replication and sample loss.
Suitable for chemical deposition and growth, and develop new materials.
标准氮化硅薄膜规格（基底厚度525um或200um）：
Standard silicon nitride film window specifications (substrate thickness of 525um or 200um)
1、 外框5mm×5mm，窗口大小1.5mm×1.5mm，膜厚50/100/150/200nm
Frame 5mm×5mm，window size 1.5mm×1.5mm，thickness 50/100/150/200nm
2、 外框7.5mm×7.5mm，窗口大小3mm×3mm，膜厚50/100/150/200nm
Frame7.5mm×7.5mm，window size 3mm×3mm，thickness 50/100/150/200nm
3、 外框3mm直径，窗口大小0.1mm×0.1mm×9，膜厚20/50/100nm
Frame diameter 3mm，window size 0.1mm×0.1mm×9，thickness 20/50/100nm
4、 外框3mm直径，窗口大小1mm×1mm，膜厚20/50/100/150nm
Frame diameter 3mm，window size1mm×1mm，thickness 20/50/100nm
5、 外框3mm直径，窗口大小0.1mm×1.5mm×2，膜厚20/50/100nm
Frame diameter 3mm，window size0.1mm×1.5mm×2，thickness20/50/100nm
非标准氮化硅薄膜窗口接受客户要求定制，但是订购量多，价格会降低。（一般建议100片以上订购，平均单价会比较低。）
For non-standard silicon nitride film window, we can accept customerized requirements, and the price will be reduced if the order quantity is big (Generally suggestion, more than 100 pieces, the average unit price will be lower.)
SHNTI silicon nitride film window products are fully specified by 4 parameters: window area (B), frame thickness (D), film thickness(A) and frame diameter (C):
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