NTT-AT has been supplying high-quality XUV, EUV, and X-ray mirrors for more than 20 years. In particular, backed by its extensive experience and outstanding skills, it provides custom-designable multi-layer film mirrors adapted to meet individual customer requirements. Research institutes around the world have continued to choose NTT-AT's multi-layer mirrors because of their quality. Multi-layer materials and structure are customized to meet your detailed specifications, such as substrate, peak wavelength, bandwidth, and dispersion. High heat-durability multi-layer mirrors are also supported. A reflectivity evaluation service using synchrotron facilities is also available as an option. EUV mirrors/X-ray mirrors Inquiry We have supported many experiments and studies for synchrotron radiation applications, XFEL applications, high-order harmonics applications including attosecond science and material science, soft-X-ray laser applications, and astronomy. NTT-AT's XUV multi-layer mirrors with unparalleled quality are valued by the academic community. EUV mirrors are manufactured and sold by only a few companies globally. If you are not satisfied with your current provider, NTT-AT can fabricate custom-designed mirrors that will satisfy your most demanding requirements. NTT-AT will propose an optimized design that precisely reflects your specifications.Custom designable XUV, EUV, and X-ray mirrors, only NTT-AT in the world
Benefits
Features
Application example Substrate
materialsTypical
wavelengthXUV (EUV) mirror
Attosecond science
X-ray laserMulti-layer mirror Mp/Si
Ru/Si
Zr/Al
SiC/Mg
Cr/C50 eV ~100 eV
50 eV~100 eV
50 eV ~ 70 eV
25 eV ~50 eV
~300 eVSingle layer mirror SiC
Pt
Ru10 eV ~ 100 eV X-ray mirror Synchrotron applications
XFEL applications
Built into X-ray non-destructive
inspection devicesMulti-layer mirror W/C
W/B4C
Ru/C
Pt/C1 keV ~ 30 keV Single layer mirror C
B4C
SiC
Cr
Ni1 keV ~ 30 keV XUV multi-layer mirrors(EUV multi-layer mirrors)
Substrate shape: plane, convex, concave, paraboloid, Toroidal surface, ellipsoid
Substrate materials: Quartz, silicon, zero dewer, etc.
multi-layer film materials::Mo/Si, Ru/Si, Zr/Al, SiC/Mg, Cr/C etc.
Substrate size :φ3 mm~φ300 mm
NTT-AT will provide high-durability XUV multi-layer mirrors, highly heat-resistant XUV multi-layer film mirrors as well as optical systems, such as Schwarzschild optical systems and pump probe optical systems.Product example
Φ10mm plane mirror Measured reflectivities of Mo/Si multi-layers
(normal incident angle: 2 degrees)
Multi-layer mirror for pump probe test Measured relectivities of broadband mirrors, narrow band mirror(wavelength :30 nm)
Mo/Si multi-layer mirrors have a high reflectivity near the wavelength of 13 nm (90 eV). NTT-AT’s Mo/Si multi-layer mirrors have a reflectivity of up to 70% for normal incidence.
The materials, film structure, and substrate shape of NTT-AT’s XUV mirrors can be customized to suit your needs regarding central wavelength and optical arrangements.EUV broadband ellipsoidal mirror
(Φ100 mm zero dewer) X-ray multi-layer mirrors
Substrate figure: plane, ellipsoid, paraboloid, cylindrical surface, toroidal surface
Substrate: Quartz, Silicon, zero dewer, etc.
Substrate materials: W/B4C, W/C, Pt/C etc.
Substrate size: Max 500 mm
NTT-AT provides K-B mirror system, Walter mirror etc.Product example
W/B4C multi-layer and W/C multi-layer film mirrors have high reflectivity for hard X-ray applications. To reflect and concentrate a hard X-ray efficiently, it is necessary to minimize the oblique angle of incidence. This requires a long mirror length and a small multi-layer film cycle length. Multi-layer mirror for K-B mirror system The materials, film structure, and substrate shape of NTT-AT’s X-ray mirrors can be customized to suit your needs regarding central wavelength, bandwidth and optical arrangements. Evaluated reflectivity (wavelength: 0.154 nm, Blue: measured reflectivity, Pink: calculated reflectivity, periodic length: 2.95 nm) Single layer mirrors
Substrate figure: plane ,ellipsoid ,Paraboloid ,cylindrical surface ,toroidal surface
Substrate materials: Quartz, Silicon, zero dewer, etc.
Multi-layer materials: C, B4C, SiC, Ru, NbN, Pt, etc.
Substrate size: Max 500 mm
NTT-AT provides K-B mirror system, Walter mirror, etc.Single layer mirrors, which use total reflection, are used for beam steering, light concentration and removal of unneeded wavelengths in the XUV to X-ray range.
The materials and substrate shape of NTT-AT’s single layer mirrors can be customized to suit your needs regarding central wavelength and optical arrangements.
Ellipsoidal mirror with Ru layer Past record
NTT-AT provides low-cost, short lead-time, and stable-quality multi-layer mirrors for industrial applications of EUV light including EUV lithography. We are ideally positioned to support your practical use of EUVL light source developments, EUV resist developments, EUV mask inspections, and other peripheral areas as your R&D partner.Paper lists
Publication list (including co-authored papers):
Comparison with other companies’ products