The Zeta-20 optical
profiler is a non-contact, 3D surface topography measurement system. The system
is powered by patented ZDot™ technology and Multi-Mode optics,
enabling measurement of a variety of samples: transparent and opaque, low to
high reflectance, smooth to rough texture, and step heights from nanometers to
millimeters.
The Zeta-20
integrates six different optical metrology technologies in one configurable and
easy-to-use system. ZDot™ measurement mode simultaneously
collects a high-resolution 3D scan and a True Color infinite focus image. Other
3D measurement techniques include white light interferometry, Nomarski
interference contrast microscopy, and shearing interferometry. Film thickness
can be measured with ZDot or an integrated broadband reflectometer. The Zeta-20
is also a high-end microscope that can be used for sample review or automated
defect inspection. The Zeta-20 supports both R&D and production
environments by providing comprehensive step height, roughness, and film
thickness measurements, and defect inspection capability.
Function
Step Height: It is capable of measuring 3D, non-contact
step heights from nanometers to millimeters.
Roughness and
Waviness: Roughness
and waviness ranging from tens of nanometers to very rough surfaces
Thin
Film Stress:2D stress
Bow
and Shape:3D shape or bow of a surface
Film
Thickness: 30nm to 100µm.
Defect
Inspection: Inspect the sample with the defect which
bigger than 1μm
Defect Review: Defect
review uses an inspection tool KLARF file to drive the stage to the defect
locations
Features
Easy to use optical profiler with ZDot and Multi-Mode
optics to address a wide range of applications: high-quality microscope for
sample review or defect inspection
Technical capacity
Schott glass--Roughness and Waviness
Used to measure the appearance
and Roughness of transparent and opaque surfaces such as glass
Photovoltaic
Solar Cells--measure surfaces that combine very low and
very high reflectance materials.
Measure the very low and very high reflectance regions easily to get bow and shape
MEMS device–step height and roughness
Small sample with step accuracy of nm, large sample with step accuracy of sub-µm
Lens--complete surface profile
Stitching software
utilizes the motorized XY stage to combine adjacent scans to generate a
stitched data
Polymer film--measurements of film thickness
Be used to measure the film thickness of PI and PR, and generate the film
thickness mapping
Of entire wafer。
Sapphire--Surface defect
of
patterned wafer
Rapidly inspect
the sample with 3D metrology capability, differentiate different defect types
according to brightness, size and length-width ratio ,and map defect density
across the sample.
Other
Customer List
Nanjing University.
Nanjing University of Posts and Telecommunications
MIT(Massachusetts Institute of Technology)
University of California
Yale University.
University of Texas at Austin.
Western Digital Corp
Applied Materials
Bosch
Leicester University.
Seagate
pertinent literature
1. Maxym V.Rukosuyev, et al. One-step fabrication of superhydrophobic hierarchical structures by femtosecond laser ablation. Applied Surface Science. 2014,313,411-417.
2. H. N. Shubha, et al. Preparation of Self Assembled Sodium Oleate Monolayer on Mild Steel and Its Corrosion Inhibition Behavior in Saline water. ACS Appl. Mater. Interfaces .2013,5,21,10738-10744.
3. Marta Palacios-Cuesta, et al. Fabrication of Functional Wrinkled Interfaces from Polymer Blends: Role of the Surface Functionality on the Bacterial Adhesion. Polymers. 2014, 6,11, 2845-2861.
4. Alberto Gallardo, et al. Chemical and Topographical Modification of Polycarbonate Surfaces through Diffusion/Photocuring Processes of Hydrogel Precursors Based on Vinylpyrrolidone. Langmuir .2017,33 ,7, 1614-1622.
5. Aurora Nogales, et al. Wrinkling and Folding on Patched Elastic Surfaces: Modulation of the Chemistry and Pattern Size of Microwrinkled Surfaces. ACS Appl. Mater. Interfaces. 2017,9,23,20188-20195.
6. Olga Kraynis, et al. Suitability of Raman Spectroscopy for Assessing Anisotropic Strain in Thin Films of Doped Ceria. Adv. Funct. Mater. 2019, 1804433,2-7.