On-line service
021-64283335

Home> > Products > The Alpha-Step D-500 stylus profiler

      1. Single-Chip AFM
      2. Small sample AFM
      3. Large sample AFM
      4. Biology AFM
      5. Photoinduced Force Microscope
      6. Scanning Thermal Microscopy
      7. Scanwave Impedance Microscopy
      8. AFM In-SEM
      +
      1. D series
      2. P series
      +
      1. Zeta series
      2. White light interferometer
      +
      1. Single Spot Thickness
      2. Microscopic-Spot Thickness
      3. Automated Thickness Mapping
      +
    5. +
      1. SPR Microscopy
      2. Surface plasmon resonance
      +
    7. +
    +
    1. +
      1. Nano strecher
      +
    3. +
      1. In-SEM Manipulation
      2. In-SEM Nanoindentor
      +
    +
      1. Small R&D platform
      2. Manual Probe Station
      3. Automated Probe Station
      4. High Power Probe Station
      +
      1. Needles&Accessories
      +
    +
      1. In-SEM Atomic Microscopy
      +
      1. In-SEM Nanoindentor
      2. In-SEM Nano Manipulation
      +
      1. In-Situ Chips&Holder
      +
    +
      1. Nanoimprinter Research
      +
      1. PLD Pulse Laser Deposition
      +
      1. Passive isolation station
      2. Active isolation station
      +
    +
      1. AFM Probes
      2. AFM Standard
      3. AFM Sample holder
      +
      1. Silicon Nitride Film Window
      2. Quantifoil
      3. TEM Accessories
      4. SEM Accessories
      5. X-ray Accessories
      +
      1. GGB Needles
      +
      1. Grating mold
      2. Pillar mold
      3. Hole mold
      +
    5. +
    +
The Alpha-Step D-500 stylus profiler
Brand ：KLA
Model ：D500
Keywords ：Stylus, Surface Roughness, Step Height,D500
Download Brochure

    

The Alpha-Step D-500 stylus profiler supports 2D measurements of step height, roughness, bow and stress. The innovative optical lever sensor technology offers high resolution measurements, large vertical range and low force measurement capability.

An advantage of the stylus measurement technique is that it is a direct measurement, independent of material properties. Adjustable force and choice of stylus enable accurate measurements of a wide variety of structures and materials. This enables quantification of your process to determine the amount of material added or removed, plus any changes in structure by measuring roughness and stress.


  

II.Functions and Features


Features 


  Step Height: Nanometers to 1200µm

 Low Force: 0.03 to 15mg

 Video: 5MP high-resolution color camera

 Keystone Correction: Removes distortion due to side view optics

 Arc Correction: Removes error due to arc motion of the stylus

 Compact Size: Smallest system footprint for a benchtop stylus profiler

 Software: User friendly software interface


   

Applications


 Step Height: 2D step height

  Texture: 2D roughness and waviness

  Form: 2D bow and shape

  Stress: 2D thin film stress  


Industries


·Universities, research labs and institutes

·Semiconductor and compound semiconductor

·LED: Light emitting diodes

·Solar

·MEMS: Micro-electro-mechanical systems

·Automotive

·Medical devices

·And more: Contact us with your requirements


    

III.Applications Details


    Step Height

The Alpha-Step D-500 stylus profiler is capable of measuring 2D step heights from nanometers to 1200µm. This enables quantification of material deposited or removed during etch, sputter, SIMS, deposition, spin coatings, CMP and other processes. The Alpha-Step series has loforce capability that enables measurement of soft materials, such as photoresist.



    Texture: Roughness and Waviness

The Alpha-Step D-500 measures 2D texture, quantifying the sample's roughness and waviness. Software filters separate the measurement into the roughness and waviness components and calculate parameters such as root mean square (RMS) roughness.


    Form: Bow and Shape

    

The Alpha-Step D-500 can measure the 2D shape or bow of a surface. This includes the measurement of wafer bow that can result from mismatch between layers during the device fabrication, such as the deposition of multiple layers for the production of semiconductor or compound semiconductor devices. The D-500 can also quantify the height and radius of curvature of structures, such as a lens.


  

Stress: 2D Thin Film Stress

The Alpha-Step D-500 is capable of measuring stress induced during the manufacture of devices with multiple process layers, such as semiconductor or compound semiconductor devices. The bow of the sample is accurately measured using a stress chuck to support the sample in a neutral position. The change in shape from a process such as film deposition is then used to calculate the stress by applying Stoney's equation.